Page 96 - 《橡塑技术与装备》英文版2026年3期

HINA R&P TECHNOLOGY AND EQUIPMENT

are shown in Figure 5(c) and Figure 5(d). This is also attributed improvement in the crosslinking density of the system.
@
to the excellent thermal stability of KKNFs SiO 2 itself and the

Figure 5 (a) TGA and (b) DTG curves of KKNFs @ SiO 2 /EPDM nanocomposites

@
Table 4 Thermal decomposition data of KKNFs SiO 2 / enhanced. The LAR and MAR of 5-KKNFs SiO 2 /EPDM
@
EPDM nanocomposites decreased by 69.9% and 47.6%, respectively, compared to
T 5 /℃ T 10 /℃ T max /℃ R 800 /%
EPDM 351.7 409.2 453.0 26.75 EPDM. On the one hand, the nano-SiO2 and KH550 coated on
@
5-mKNFs SiO 2 /EPDM 358.2 413.6 453.7 28.83 the surface of KKNFs SiO 2 form a layer of Si-O-Si film that
@
@
1-KKNFs SiO 2 /EPDM 356.3 418.3 453.3 26.89
@
@
3-KKNFs SiO 2 /EPDM 361.6 420.0 453.5 28.28 is difficult to decompose after ablation, making KKNFs SiO 2
5-KKNFs SiO 2 /EPDM 360.3 414.8 454.0 30.25 possess high char yield and high temperature resistance; on
@
@
7-KKNFs SiO 2 /EPDM 383.3 422.9 454.2 31.02
the other hand, the high crosslinking density of the previously
@
2.5 Ablation performance demonstrated KKNFs SiO 2 /EPDM system means that a
As shown in Figure 6(a), the LAR and MAR of EPDM denser crosslinked structure is formed inside the system, which
are 0.253 mm/s and 0.129 g/s, respectively. In comparison, gives the composite material higher thermal decomposition
@
the LAR and MAR of 5-mKNFs SiO 2 /EPDM decreased resistance, thus achieving excellent ablation resistance. Figure
@
by 46.64% and 34.11%, respectively. After surface grafting 6(b) shows that as the content of KKNFs SiO 2 increases, both
@
with KH550, the enhancement effect of KKNFs SiO 2 on the LAR and MAR of the composite material continuously
@
the ablation resistance of the composite material was further decrease. The LAR and MAR of 7-KKNFs SiO 2 /EPDM are
·50· Vol.52，No.3